Mos system (Record no. 16336)

MARC details
000 -LEADER
fixed length control field 01937nam a2200277Ia 4500
003 - CONTROL NUMBER IDENTIFIER
control field OSt
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20251224123416.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 220909b |||||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781107005938
037 ## - SOURCE OF ACQUISITION
Terms of availability Textbook
040 ## - CATALOGING SOURCE
Original cataloging agency CSL
Language of cataloging eng
Transcribing agency CSL
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
084 ## - COLON CLASSIFICATION NUMBER
Classification number C6:212, Q4 TC
Assigning agency CSL
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Engstrom, Olof
Relator term author.
9 (RLIN) 859360
245 #0 - TITLE STATEMENT
Title Mos system
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. UK:
Name of publisher, distributor, etc. CUP,
Date of publication, distribution, etc. 2014.
300 ## - PHYSICAL DESCRIPTION
Extent 9, 355p.
Other physical details : ill.
500 ## - GENERAL NOTE
General note Index 352-355p.
520 ## - SUMMARY, ETC.
Summary, etc. This detailed and up-to-date guide to modern MOS structures describes important tools, cutting-edge models, novel phenomena and current challenges in measuring and improving the control of future MOS systems for transistor channels. Building up from basic electrostatics, it introduces the ideal MOS system, physical and electrical properties of high-k oxides, their dielectric constants, and energy offsets to semiconductors and metals, before moving on to electrical and physical characterization methods for high-k dielectric materials. Finally, real MOS systems are introduced: high-k dielectrics and interlayers, the influence of phonon dynamics, interface states and bulk traps, effective metal work functions, gate leakage phenomena and high mobility channel materials. Abstract concepts are supported by practical examples and critical comparison, encouraging an intuitive understanding of the principles at work, and presented alongside recent theoretical and experimental results, making this the ideal companion for researchers, graduate students and industrial development engineers working in nanoelectronics.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Carrier capture
9 (RLIN) 859361
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Electrical characterization
9 (RLIN) 859362
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Gate metals
9 (RLIN) 859363
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Electron states
9 (RLIN) 859364
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Classification part C6:212, Q4 TC
Koha item type Textbook
Source of classification or shelving scheme Colon Classification (CC)
Suppress in OPAC No
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Source of acquisition Total Checkouts Full call number Barcode Date last seen Price effective from Koha item type
        Central Science Library Central Science Library 2022-09-12 2939, 18/03/2015, Ashutosh Technical Books   C6:212 Q4 TC SL1598379 2022-09-12 2022-09-12 Textbook
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