David R. Medeiros; Michael T. Postek; Hal Kusunose; Takayoshi Matsuyama; A. Meyyappan; Min Bai; Sergey Babin; Andreas Erdmann; Ray J. Hoobler; Christian Kalus; Kurt R. Kimmel; Randall Lee; Vladimir Liberman; Wilhelm Maurer; S. Muckenhirn; James Potzick; Masatoshi Oda; C. Grant Willson; P.J.M. van Adrichem; Joerg Butschke; Shirley Hemar; Frank-Michael Kamm; Florian Letzkus; Hans Loeschner; Franklin Schellenberg; Yoshio Nishi; Michael T. Takac; Shane R. Palmer; Syed Rizvi; Hisatake Sano; R. Lal Tummala; Christer Rydberg; Anja Rosenbusch; Norio Saitou; Pei-yang Yan; Yung-Tsai Yen; Andrew G. Zanzal; Axel Zibold; Nobuyuki Yoshioka; Ebru Apak; Makato Yonezawa; Michael Lercel; R. Fabian Pease; Dachen Chu; Benjamen M. Rathsack(Personal Name)
Machine generated authority record
Work cat.: (OSt)1785528: David R. Medeiros; Michael T. Postek; Hal Kusunose; Takayoshi Matsuyama; A. Meyyappan; Min Bai; Sergey Babin; Andreas Erdmann; Ray J. Hoobler; Christian Kalus; Kurt R. Kimmel; Randall Lee; Vladimir Liberman; Wilhelm Maurer; S. Muckenhirn; James Potzick; Masatoshi Oda; C. Grant Willson; P.J.M. van Adrichem; Joerg Butschke; Shirley Hemar; Frank-Michael Kamm; Florian Letzkus; Hans Loeschner; Franklin Schellenberg; Yoshio Nishi; Michael T. Takac; Shane R. Palmer; Syed Rizvi; Hisatake Sano; R. Lal Tummala; Christer Rydberg; Anja Rosenbusch; Norio Saitou; Pei-yang Yan; Yung-Tsai Yen; Andrew G. Zanzal; Axel Zibold; Nobuyuki Yoshioka; Ebru Apak; Makato Yonezawa; Michael Lercel; R. Fabian Pease; Dachen Chu; Benjamen M. Rathsack, Handbook of Photomask Manufacturing Technology