Hitchon W N G <br/><br/>
Plasma processes for semiconductor fabrication by W N G Hitchon 

 - Cambridge  Cambridge University Press          1999 
 - ix,221p  cm. 
 - Cambridge studies in semiconductor physics and microelectronic engineering; 8 .
<br/><br/> Glossary 189-204p; Bibliography 205-211p; Index 213-221p; ^n23/CSL/Carpa/99-2000/226^d1999-06-22^mPurchase; ; 99-2000/140^b1999-08-02^c326^d1999-07-30^eLibco Book Distributors; ; 1999-08-09^c1999-08-22^r1999-10-16 
<br/><br/><label>ISBN: </label>0521591759 (hbd)  � 40.00 
<br/><br/><label>Standard No.: </label>6213 
<br/><br/><label>Source: </label> Libco,  Textual 
<br/><br/><label>Subjects--Topical Terms: </label><br/> Conduction<br/> Electricity<br/> Semiconductors<br/>Physics
<br/><br/><label>Dewey Class. No.: </label>C6:212, N9