Parashar Ayushman <br/><br/>
Influence of plasma enhanced chemical vapour deposition process parameters on the growth and properties of hydrogenated micro/ nanocrystalline silicon films 

 -  2010 
<br/><br/><label>Standard No.: </label>3496 
<br/><br/><label>Source: </label> Theses 
<br/><br/><label>Subjects--Topical Terms: </label><br/>PHYSICS