APA
Franklin Schellenberg; Peter James Osler; Raminderpal Singh; Robert W. Dutton; Leon Stok; Georges G.E. Gielen; Sanjay Pant; Sherief Reda; Rajendran Panda; H. Alan Mantooth; Mattan Kamon; Kurt Keutzer; Joel R. Phillips; Andrzej J. Strojwas; Naehyuck Chang; Luciano Lavagno; Louis Scheffer; Grant Martin; Sachin S. Sapatnekar; Paul D. Franzon; Sunil P. Khatri; James H. Hogan; Michael D. Hutton; Mark Bales; Vinod Kariat; Fan Mo; Nishath Verghese; Mark Donald Johnson; Jose C. Monteiro; Rob A. Rutenbar; David T. Blaauw; Robert A. Todd; Jaijeet Roychowdhury; Ralph B. Iverson; Andrew B. Kahng; William H. Kao; John Maxwell Cohn; Nicola Dragone; Vivek Tiwari; Narendra Shenoy; Vaughn Betz; David J. Hathaway; Edwin Chihchuan Kan; Fabio Somenzi; Scott T. Becker; Peter C. Spink; Robert K. Brayton; Rajat Chaudhry; Changhoon Choi; Makoto Nagata; Rakesh Patel; David G. Chinnery; Katherine L. Fetty; Laurence W. Grodd; Chi-Yuan Lo; Mark Basel; Carlo Guardiani; Andreas Kuehlmann, .EDA for IC Implementation, Circuit Design, and Process Technology. : Taylor and Francis.
Chicago
Franklin Schellenberg; Peter James Osler; Raminderpal Singh; Robert W. Dutton; Leon Stok; Georges G.E. Gielen; Sanjay Pant; Sherief Reda; Rajendran Panda; H. Alan Mantooth; Mattan Kamon; Kurt Keutzer; Joel R. Phillips; Andrzej J. Strojwas; Naehyuck Chang; Luciano Lavagno; Louis Scheffer; Grant Martin; Sachin S. Sapatnekar; Paul D. Franzon; Sunil P. Khatri; James H. Hogan; Michael D. Hutton; Mark Bales; Vinod Kariat; Fan Mo; Nishath Verghese; Mark Donald Johnson; Jose C. Monteiro; Rob A. Rutenbar; David T. Blaauw; Robert A. Todd; Jaijeet Roychowdhury; Ralph B. Iverson; Andrew B. Kahng; William H. Kao; John Maxwell Cohn; Nicola Dragone; Vivek Tiwari; Narendra Shenoy; Vaughn Betz; David J. Hathaway; Edwin Chihchuan Kan; Fabio Somenzi; Scott T. Becker; Peter C. Spink; Robert K. Brayton; Rajat Chaudhry; Changhoon Choi; Makoto Nagata; Rakesh Patel; David G. Chinnery; Katherine L. Fetty; Laurence W. Grodd; Chi-Yuan Lo; Mark Basel; Carlo Guardiani; Andreas Kuehlmann, .EDA for IC Implementation, Circuit Design, and Process Technology. : Taylor and Francis.
Harvard
Franklin Schellenberg; Peter James Osler; Raminderpal Singh; Robert W. Dutton; Leon Stok; Georges G.E. Gielen; Sanjay Pant; Sherief Reda; Rajendran Panda; H. Alan Mantooth; Mattan Kamon; Kurt Keutzer; Joel R. Phillips; Andrzej J. Strojwas; Naehyuck Chang; Luciano Lavagno; Louis Scheffer; Grant Martin; Sachin S. Sapatnekar; Paul D. Franzon; Sunil P. Khatri; James H. Hogan; Michael D. Hutton; Mark Bales; Vinod Kariat; Fan Mo; Nishath Verghese; Mark Donald Johnson; Jose C. Monteiro; Rob A. Rutenbar; David T. Blaauw; Robert A. Todd; Jaijeet Roychowdhury; Ralph B. Iverson; Andrew B. Kahng; William H. Kao; John Maxwell Cohn; Nicola Dragone; Vivek Tiwari; Narendra Shenoy; Vaughn Betz; David J. Hathaway; Edwin Chihchuan Kan; Fabio Somenzi; Scott T. Becker; Peter C. Spink; Robert K. Brayton; Rajat Chaudhry; Changhoon Choi; Makoto Nagata; Rakesh Patel; David G. Chinnery; Katherine L. Fetty; Laurence W. Grodd; Chi-Yuan Lo; Mark Basel; Carlo Guardiani; Andreas Kuehlmann, .EDA for IC Implementation, Circuit Design, and Process Technology. : Taylor and Francis.
MLA
Franklin Schellenberg; Peter James Osler; Raminderpal Singh; Robert W. Dutton; Leon Stok; Georges G.E. Gielen; Sanjay Pant; Sherief Reda; Rajendran Panda; H. Alan Mantooth; Mattan Kamon; Kurt Keutzer; Joel R. Phillips; Andrzej J. Strojwas; Naehyuck Chang; Luciano Lavagno; Louis Scheffer; Grant Martin; Sachin S. Sapatnekar; Paul D. Franzon; Sunil P. Khatri; James H. Hogan; Michael D. Hutton; Mark Bales; Vinod Kariat; Fan Mo; Nishath Verghese; Mark Donald Johnson; Jose C. Monteiro; Rob A. Rutenbar; David T. Blaauw; Robert A. Todd; Jaijeet Roychowdhury; Ralph B. Iverson; Andrew B. Kahng; William H. Kao; John Maxwell Cohn; Nicola Dragone; Vivek Tiwari; Narendra Shenoy; Vaughn Betz; David J. Hathaway; Edwin Chihchuan Kan; Fabio Somenzi; Scott T. Becker; Peter C. Spink; Robert K. Brayton; Rajat Chaudhry; Changhoon Choi; Makoto Nagata; Rakesh Patel; David G. Chinnery; Katherine L. Fetty; Laurence W. Grodd; Chi-Yuan Lo; Mark Basel; Carlo Guardiani; Andreas Kuehlmann, .: Taylor and Francis. .
TextLanguage: English Publication details: Taylor and Francis; 2006ISBN: 
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