| 000 | 01157nam a2200313Ia 4500 | ||
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| 003 | OSt | ||
| 005 | 20221007123313.0 | ||
| 006 | a|||||r|||| 00| 0 | ||
| 007 | ta | ||
| 008 | 221006b |||||||| |||| 00| 0 eng d | ||
| 020 |
_a0521591759 (hbd) _c� 40.00 |
||
| 024 | _a6213 | ||
| 037 |
_bLibco, _cTextual |
||
| 040 |
_aPAPL _cPAPL _beng |
||
| 041 |
_2eng _aeng |
||
| 082 | _aC6:212, N9 | ||
| 100 |
_aHitchon W N G _9717063 |
||
| 245 | 0 | _aPlasma processes for semiconductor fabrication by W N G Hitchon | |
| 260 |
_aCambridge _bCambridge University Press _c1999 |
||
| 300 |
_aix,221p _ccm. |
||
| 490 | _aCambridge studies in semiconductor physics and microelectronic engineering; 8 | ||
| 500 | _aGlossary 189-204p; Bibliography 205-211p; Index 213-221p; ^n23/CSL/Carpa/99-2000/226^d1999-06-22^mPurchase; ; 99-2000/140^b1999-08-02^c326^d1999-07-30^eLibco Book Distributors; ; 1999-08-09^c1999-08-22^r1999-10-16 | ||
| 650 | _a Conduction | ||
| 650 |
_a Electricity _9264331 |
||
| 650 |
_a Semiconductors _9468426 |
||
| 650 | _aPhysics | ||
| 942 |
_hC6:212, N9 _cTEXL _2CC |
||
| 999 |
_c1211675 _d1211675 |
||