000 01105nam a2200313Ia 4500
003 OSt
005 20221007123330.0
006 a|||||r|||| 00| 0
007 ta
008 221006b |||||||| |||| 00| 0 eng d
020 _a0471330019 (hbd)
_c
_ 84.95
024 _a6930
037 _bAshutosh,
_cTextual
040 _aPAPL
_cPAPL
_beng
041 _2eng
_aeng
082 _aC6:212;197, P0
100 _aMahan John E
_9717110
245 0 _aPhysical vapor deposition of thin films by John E Mahan
260 _aNew
_bYork John Wiley Sons, Inc
_c2000
300 _axiii,312p
_ccm.
500 _aIncludes bibliographical references; Index 305-312p; ^n23/CSL/Carpa/00-01/23^d2000-08-24^mPurchase; ; 2000-2001/191^b2000-08-29^cATB 88^d2000-08-25^eRs.3,461.10^fAshutosh Technical Books; ; 2000-09-09^bSB^c2001-02-02^dRPS
650 _a Conduction
650 _a Electricity
_9264331
650 _a Semiconducting
_9717111
650 _a Thin films
_9717112
650 _aPhysics
942 _hC6:212;197, P0
_cTEXL
_2CC
999 _c1211707
_d1211707