| 000 | 01363nam a2200277Ia 4500 | ||
|---|---|---|---|
| 005 | 20260324132039.0 | ||
| 008 | 008 260324s9999 xx 000 0 eng d | ||
| 020 | _a9781315220833 | ||
| 037 | _aEBOOK | ||
| 040 | _aCRL | ||
| 040 | _beng | ||
| 040 | _cCRL | ||
| 041 | _2eng | ||
| 041 | _aeng | ||
| 084 | _qCRL | ||
| 100 |
_aDavid R. Medeiros; Michael T. Postek; Hal Kusunose; Takayoshi Matsuyama; A. Meyyappan; Min Bai; Sergey Babin; Andreas Erdmann; Ray J. Hoobler; Christian Kalus; Kurt R. Kimmel; Randall Lee; Vladimir Liberman; Wilhelm Maurer; S. Muckenhirn; James Potzick; Masatoshi Oda; C. Grant Willson; P.J.M. van Adrichem; Joerg Butschke; Shirley Hemar; Frank-Michael Kamm; Florian Letzkus; Hans Loeschner; Franklin Schellenberg; Yoshio Nishi; Michael T. Takac; Shane R. Palmer; Syed Rizvi; Hisatake Sano; R. Lal Tummala; Christer Rydberg; Anja Rosenbusch; Norio Saitou; Pei-yang Yan; Yung-Tsai Yen; Andrew G. Zanzal; Axel Zibold; Nobuyuki Yoshioka; Ebru Apak; Makato Yonezawa; Michael Lercel; R. Fabian Pease; Dachen Chu; Benjamen M. Rathsack _91187832 |
||
| 245 | 0 | _aHandbook of Photomask Manufacturing Technology | |
| 260 | _bTaylor and Francis | ||
| 260 | _c2005 | ||
| 365 | _a | ||
| 365 | _b560 | ||
| 856 | _uhttp://www.taylorfrancis.com/books/9781315220833 | ||
| 942 | _cEBOOK | ||
| 999 |
_c1785528 _d1785528 |
||