| 000 | 00891nam a2200301Ia 4500 | ||
|---|---|---|---|
| 003 | OSt | ||
| 005 | 20220912150126.0 | ||
| 006 | a|||||r|||| 00| 0 | ||
| 007 | ta | ||
| 008 | 220909b |||||||| |||| 00| 0 eng d | ||
| 020 | _a0471005770 (hbd) | ||
| 024 | _a10570 | ||
| 037 | _bAshutosh, | ||
| 037 | _cTextual | ||
| 040 |
_aCSL _beng _cCSL |
||
| 041 | _aeng | ||
| 082 | _aC9B58, N4 | ||
| 100 | _aLieberman Michael A | ||
| 245 | 0 | _aPrinciples of plasma discharges and materials processing | |
| 260 |
_aNew York John Wiley Sons, Inc. _c1994 |
||
| 300 | _axxvi, 572p | ||
| 500 | _aAppendix A-C, 541-558p; Index 559-572p; ^n23/CSL/C/2002-2003/323^d2002-09-10^mPurchase | ||
| 650 | _a Plasma | ||
| 650 | _aPhysics | ||
| 700 | _a Lichtenberg Allan J | ||
| 942 |
_hC9B58, N4 _cTEXL _2CC |
||
| 999 |
_c40232 _d40232 |
||