000			03014nam a2200289Ia 4500
003			OSt
005			20260311095005.0
008			220909b |||||||| |||| 00| 0 eng d
020			_a9781482222050
037			_cTextual
040			_aCSL _beng _cCSL
041			_aeng
084			_aC9B580aD65 Q5 TC _qCSL
100			_aMakabe, Toshiaki _91131590
245		0	_aPlasma electronics: applications in microclectronic device fabrication
250			_a2nd
260			_aBoca Raton: _bCRC Press, _c2015.
300			_axxxv, 376p. _b: ill.
500			_aIncludes bibliographical references; Index 369-376p.
520			_aBeyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this bookequips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
650			_aMomentum balance of electrons _91131591
650			_aPlasma and its classification _91131592
650			_aAcademic fusion _91131593
700			_aPetrovic, Zoran Lj. _91131594
942			_hC9B580aD65 Q5 TC _cTB _2CC
999			_c6888 _d6888