| 000 | 00746nam a2200265Ia 4500 | ||
|---|---|---|---|
| 003 | OSt | ||
| 005 | 20220912151541.0 | ||
| 006 | a|||||r|||| 00| 0 | ||
| 007 | ta | ||
| 008 | 220909b |||||||| |||| 00| 0 eng d | ||
| 024 | _a49973 | ||
| 037 | _cTextual | ||
| 040 |
_aCSL _beng _cCSL |
||
| 041 | _aeng | ||
| 082 | _aC6:212, M8 | ||
| 100 | _aRubloff G W Ed. | ||
| 111 | _aAmerican Institute of Physics Conference Proceedings | ||
| 245 | 0 | _aDeposition and growth: limits for microelectronics | |
| 260 |
_aNew York _b AIP _c1988 |
||
| 300 |
_a388p. _ccm. |
||
| 490 | _aAmerican Vacuum Society Series; 4 | ||
| 650 | _aSemiconductors | ||
| 942 |
_hC6:212, M8 _cTEXL _2CC |
||
| 999 |
_c71046 _d71046 |
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