000 00532nam a2200217Ia 4500
003 OSt
005 20220928151353.0
006 a|||||r|||| 00| 0
007 ta
008 220927b |||||||| |||| 00| 0 eng d
024 _a123676
037 _cTextual
040 _aSDCL
_cSDCL
_beng
041 _2eng
_aeng
082 _aE141, M 2
100 _aGrabmaier J Ed.
_9517217
245 0 _aSilicon chemical etching.
260 _c1982
942 _hE141, M 2
_cTEXL
_2CC
999 _c851340
_d851340