Deposition and growth: limits for microelectronics
By: Material type:
TextLanguage: English Series: American Vacuum Society Series; 4Publication details: New York AIP 1988Description: 388p. cmSubject(s): DDC classification: - C6:212, M8
Textual
| Cover image | Item type | Current library | Home library | Collection | Shelving location | Call number | Materials specified | Vol info | URL | Copy number | Status | Notes | Date due | Barcode | Item holds | Item hold queue priority | Course reserves | |
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Central Science Library | Central Science Library | C6:212 M8 (Browse shelf(Opens below)) | Available | SL1023655 |
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Deposition and growth: limits for microelectronics
APA
Rubloff G W Ed, American Institute of Physics Conference Proceedings, . (1988). Deposition and growth: limits for microelectronics. New York: AIP.
Chicago
Rubloff G W Ed, American Institute of Physics Conference Proceedings, . 1988. Deposition and growth: limits for microelectronics. New York: AIP.
Harvard
Rubloff G W Ed, American Institute of Physics Conference Proceedings, . (1988). Deposition and growth: limits for microelectronics. New York: AIP.
MLA
Rubloff G W Ed, American Institute of Physics Conference Proceedings, . Deposition and growth: limits for microelectronics. New York: AIP. 1988.
