Plasma processes for semiconductor fabrication by W N G Hitchon
Material type:
TextLanguage: English Series: Cambridge studies in semiconductor physics and microelectronic engineering; 8Publication details: Cambridge Cambridge University Press 1999Description: ix,221p cmISBN: - 0521591759 (hbd)
- C6:212, N9
Textual
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Textual
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Department of Physics and Astrophysics Library | Department of Physics and Astrophysics Library | C6:212 N9 (Browse shelf(Opens below)) | Available | PA0005230 |
Glossary 189-204p; Bibliography 205-211p; Index 213-221p; ^n23/CSL/Carpa/99-2000/226^d1999-06-22^mPurchase; ; 99-2000/140^b1999-08-02^c326^d1999-07-30^eLibco Book Distributors; ; 1999-08-09^c1999-08-22^r1999-10-16
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